We have successfully fabricated the first batch of our Aluminum Gallium Arsenide-based waveguides for four-wave mixing experiments. Since our in-house cleanroom is in the final phase of setup, these devices were fabricated using tools at nanofabrication user facilities of INRS and Cornell University. Patterning was performed using Ebeam lithography system at LMN (INRS, Montreal) and the fabrication was completed using an ICP-RIE etching system at CNF (Cornell, Ithaca). Scanning Electron Microscopy reveals encouraging results in terms of low side wall roughness and good verticality. The devices will now be optically characterized for losses before performing four-wave mixing experiments.
Kashif Masud Awan
